Pre-recorded Sessions: From 4 December 2020 | Live Sessions: 10 – 13 December 2020

4 – 13 December 2020

#SIGGRAPHAsia | #SIGGRAPHAsia2020

Technical Papers

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Date/Time: 04 – 13 December 2020
All presentations are available in the virtual platform on-demand.


Lecturer(s):
Liang Shi, MIT CSAIL, United States of America
Beichen Li, MIT CSAIL, United States of America
Miloš Hašan, Adobe Inc., United States of America
Kalyan Sunkavalli, Adobe Inc., United States of America
Tamy Boubekeur, Adobe Inc., France
Radomir Mech, Adobe Inc., United States of America
Wojciech Matusik, MIT CSAIL, United States of America

Bio:

Description: We present MATch, a method to automatically convert photographs of material samples into production-grade procedural material models. At the core of MATch is a new library DiffMat that provides differentiable building blocks for constructing procedural materials, and automatic translation of large-scale procedural models, with hundreds to thousands of node parameters, into differentiable node graphs. Combining these translated node graphs with a rendering layer yields an end-to-end differentiable pipeline that maps node graph parameters to rendered images. This facilitates the use of gradient-based optimization to estimate the parameters such that the resulting material, when rendered, matches the target image appearance, as quantified by a style transfer loss. In addition, we propose a deep neural feature-based graph selection and parameter initialization method that efficiently scales to a large number of procedural graphs. We evaluate our method on both rendered synthetic materials and real materials captured as flash photographs. We demonstrate that MATch can reconstruct more accurate, general, and complex procedural materials compared to the state-of-the-art. Moreover, by producing a procedural output, we unlock capabilities such as constructing arbitrary-resolution material maps and parametrically editing the material appearance.

 

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